Gaofeng Liang was born in Shangqiu, Henan, in 1986. He received the Ph.D. degree in plasma physics from University of Electronic Science and Technology of China, Chengdu, China, in 2017. During 2011-2015, he was a joint PhD student in the State Key Lab of Optical Technologies on nanofabrication and microengineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China. During 2015-2016, he was a joint PhD student in the Department of Electrical Engineering and Computer Science, University of Michigan - Ann Arbor, Michigan, USA. Since 2017, he has been with the College of Opt-electrionic engineering, Chongqing University, where he was a Lecturer, become an Associate Professor in 2020.

His research interests include subwavelength optics, plasmonics, and fabrication of micro- or nano-structured devices. The distinctive work is super resolution photolithography and sub-diffraction limit imaging, with over 30 scientific papers.